منابع مشابه
Carbon dioxide reduction by mononuclear ruthenium polypyridyl complexes.
New mononuclear ruthenium complexes with general formula [Ru(bid)(B)(Cl)] (bid is (1Z,3Z)-1,3-bis(pyridin-2-ylmethylene)isoindolin-2-ide; B = bidentate ligand 2,2'-bipyridine or R(2)-bpy, where R = COOEt or OMe) were synthesized and tested as precatalysts for the hydrogenative reduction of CO(2) in 2,2,2-trifluoroethanol (TFE) as solvent with added NEt(3). Significant amounts of formic acid wer...
متن کاملLight-induced metastable linkage isomers of ruthenium sulfur dioxide complexes.
The irradiation of ruthenium-sulfur dioxide complexes of general formula trans-[Ru(II)(NH(3))(4)(SO(2))X]Y with laser light at low temperature results in linkage isomerization of SO(2), starting with eta(1)-planar S-bound to eta(2)-side S,O-bound SO(2). The solid-state photoreaction proceeds with retention of sample crystallinity. Following work on trans-[Ru(NH(3))(4)Cl(eta(1)-SO(2))]Cl and tra...
متن کاملLaser Direct Writing of Hydrous Ruthenium Dioxide Micro-Pseudocapacitors
We are using a laser engineering approach to develop and optimize hydrous ruthenium dioxide (RuOxHy or RuO2·0.5 H2O) pseudocapacitors. We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with UV laser machining, to fabricate mesoscale pseudocapacitors and microbatteries under ambient temperature and atmospheric condi...
متن کاملCorrelating structure, conductance, and mechanics of silver atomic-scale contacts.
We measure simultaneously force and conductance of Ag metal point-contacts under ambient conditions at room temperature. We observe the formation of contacts with a conductance close to 1 G0, the quantum of conductance, which can be attributed to a single-atom contact, similar to those formed by Au. We also find two additional conductance features at ∼0.4 G0 and ∼1.3 G0, which have been previou...
متن کاملEvaluation of conductive-to-resistive layers interaction in thick-film resistors
Low-frequency noise spectroscopy is used to examine the interactions between resistive and conductive films that take place during thick-film resistor (TFR) fabrication. Two noise parameters are introduced to quantitatively describe the strength of these interactions. They refer to intensity and repeatability of the noise generated in the resistor interfaces. Extensive experimental studies perf...
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ژورنال
عنوان ژورنال: ElectroComponent Science and Technology
سال: 1976
ISSN: 0305-3091
DOI: 10.1155/apec.2.259